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翻訳と辞書　辞書検索 [ 開発暫定版 ] スポンサード リンク Stencil lithography ： ウィキペディア英語版 Stencil lithography Stencil lithography is a novel method of fabricating nanometer scale patterns using nanostencils, stencils (shadow mask) with nanometer size apertures. It is a resist-less, simple, parallel nanolithography process, and it does not involve any heat or chemical treatment of the substrates (unlike resist-based techniques). ==History== Stencil lithography was first reported in a scientific journal as a micro-structuring technique by S. Gray and P. K. Weimer in 1959. They used long stretched metallic wires as shadow masks during metal deposition. Various materials can be used as membranes, such as metals, Si, SixNy, and polymers. Today the stencil apertures can be scaled down to sub-micrometer size at full 4" wafer scale. This is called a nanostencil. Nano-scale stencil apertures have been fabricated using laser interference lithography (LIL), electron beam lithography, and focused ion beam lithography. 抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』 ■ウィキペディアで「Stencil lithography」の詳細全文を読む スポンサード リンク 翻訳と辞書 : 翻訳のためのインターネットリソース Copyright(C) kotoba.ne.jp 1997-2016. All Rights Reserved.